Si Delta Doped GaN Grown by Low-Pressure Metalorganic Chemical Vapor Deposition

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Effect of Si doping on strain, cracking, and microstructure in GaN thin films grown by metalorganic chemical vapor deposition

The effect of Si doping on the strain and microstructure in GaN films grown on sapphire by metalorganic chemical vapor deposition was investigated. Strain was measured quantitatively by x-ray diffraction, Raman spectroscopy, and wafer curvature techniques. It was found that for a Si concentration of 2310 cm, the threshold for crack formation during film growth was 2.0 mm. Transmission electron ...

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Photoluminescence investigation of GaN films grown by metalorganic chemical vapor deposition on (100) GaAs

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Time-Resolved Photoluminescence Characterization of GaN Layers Grown by Metalorganic Chemical Vapor Deposition

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ژورنال

عنوان ژورنال: MRS Internet Journal of Nitride Semiconductor Research

سال: 1999

ISSN: 1092-5783

DOI: 10.1557/s1092578300002635